AZ® 5214E-IR Image Reversal Photoresist

AZ 5214E-IR is a unique photoresist that can be processed in either positive or negative tone. This resist is very fast for maximum process throughput in positive tone and exhibits superior thermal stability and RIE etch resistance in negative tone. Negative tone profiles can also be optimized for metal lift-off processing. Develop in AZ Developer 1:1 or AZ 300MIF (MIF recommended for image reversal mode) and strip/lift-off in AZ 400T Stripper.

 

Items in this series:

  • AZ 5214E-IR Photoresist (Quart)
  • AZ 5214E-IR Photoresist (Gallon)
  • AZ 5214E Photoresist (Quart)
  • AZ 5214E Photoresist (Gallon)
  • AZ 5206E Photoresist (Gallon)
  • AZ 5218E Photoresist (Gallon)

 

I would like more information about AZ 5200 Series Photoresists!

 

Typical Process (Pos)

Soft Bake: 90-100C (60s) Expose: i-line or broadband Post Expose Bake: None Develop: spray, puddle or immersion                  Developer: AZ 300MIF or AZ Developer 1:1

          AZ 5214E-IR Spin Curve