EM Resist SML Series e-beam Resists and PMMA

EM SML Series are positive tone e-beam resists featuring high sensitivity and ultra-high resolution. These resists feature a novel, low etch rate polymer and imaging at up to 50:1 aspect ratios. Available viscosities cover a coated thickness range of approximately 50 to > 3,000nm.

Also available are PMMA resins ranging in molecular weight from 35K to 950K. Click the e-mail link below or contact your IMM representative for further information on PMMA and ancillary processing materials.

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