Setting up your new lithography process or trouble-shooting/optimizing existing processes is time consuming and expensive, especially when using 1x exposure systems. Eliminate frustration, save time, and reduce costs with these handy resolution test reticles produced with a wide variety of useful imaging features that minimize test iterations and streamline the optimization process.

Typical Applications

Quickly determine resolution limits for any feature type (to 1.0μm)

Find best focus

Determine print bias for any feature type

Optimize photoresist adhesion

Assess step coverage performance

Design Features

Long line/space features

Contact hole strings

All features in both positive and negative tone

Cleavable line and contact arrays

Short lines from 1.0 to 5.0μm for easy linearity measurements

Cells are individually numbered for traceability

Clear field design facilitates low angle SEM analysis

Available in all common glass sizes

Resolution Mask

Contact your Integrated Micro Materials representative for more information or a quotation for 1x test reticles.