Technical Resources
Photoresist Processing:
Profile Tuning in AZ® nLoF 2000 Series Photoresists
Image Reversal Process for AZ® 5214E-IR Photoresist
Chemistry and Processing of DUV (Chemically Amplified) Photoresists
Process Optimization and Control:
Thin Film Interference and Reflectivity Control for Lithography
Effects of Ambient Humidity on Process Control
Adhesion Promotion Using Hexamethyldisilazane (HMDS)
