| i-line/g-line Photoresist Application Guide (0.5 - 6.0μm) |
Coated Film Thickness Range (μm) | |||||||||||
| Application | Resist (Developer Type) | Exposure λ (nm) | 0.5 | 1.0 | 1.5 | 2.0 | 2.5 | 3.0 | 3.5 | 4.0 | 5.0 | 6.0 |
| General Lithography Wet Etch |
AZ 1505 (MIF/IN) | 365-450 | ||||||||||
| AZ 1512 (MIF/IN) | 365-450 | |||||||||||
| AZ 1518 (MIF/IN) | 365-450 | |||||||||||
| AZ 1529 (MIF/IN) | 365-450 | |||||||||||
| RIE Etch | AZ 3312 (MIF/IN) | 350-450 | ||||||||||
| AZ3318D (MIF/IN) | 350-450 | |||||||||||
| AZ 3330F (MIF/IN) | 350-450 | |||||||||||
| AZ 15nXT-115cps | 365 | |||||||||||
| Medium Resolution (0.5μm design rules) |
AZ MIR 703 14cps (MIF) | 365-435 | ||||||||||
| AZ MIR 703 19cps (MIF) | 365-435 | |||||||||||
| AZ MIR 900 (MIF) | 365-435 | |||||||||||
| Application | Resist (Developer Type) | Exposure λ (nm) | 0.5 | 1.0 | 1.5 | 2.0 | 2.5 | 3.0 | 3.5 | 4.0 | 5.0 | 6.0 |
| High Resolution (0.35μm design rules) |
AZ MIR 701 11cps (MIF) | 365-435 | ||||||||||
| AZ MIR 701 14cps (MIF) | 365-435 | |||||||||||
| AZ MIR 701 29cps (MIF) | 365-435 | |||||||||||
| Metal Lift-Off | AZ 5214E-IR (MIF/IN) | 365-435 | ||||||||||
| AZ nLoF 2020 (MIF) | 365 | |||||||||||
| AZ nLoF 2035 (MIF) | 365 | |||||||||||
| AZ nLoF 2070 (MIF) | 365 | See Thick Resist Application Guide | ||||||||||
| AZ nLoF 5510 (MIF) | 365 | |||||||||||
| Plating (Also see Thick Resist application guide) |
AZ P4110 (IN) | 365-450 | ||||||||||
| AZ P4210 (IN) | 365-450 | |||||||||||
| AZ P4330 (IN) | 365-450 | |||||||||||
| AZ 12XT-20PL-5 (MIF) | 365 | |||||||||||
| Spray | AZ 4999 (IN) | 365-450 | ||||||||||
| Application | Resist (Developer Type) | Exposure λ (nm) | 0.5 | 1.0 | 1.5 | 2.0 | 2.5 | 3.0 | 3.5 | 4.0 | 5.0 | 6.0 |
Zoom: