Your Premier Source for Micro Imaging Materials!

  • Home
  • Products
    • i/g-line Photoresists
    • Thick Photoresists
    • Lift-Off Photoresists
    • DUV Photoresists
    • e-beam Resists
    • Dry Film Photoresists
    • Developers
    • Anti-Reflective Coatings
    • Photoresist Removers
    • Thinners/Solvents
    • Process Chemicals
    • Adhesion Promoter
    • Photoresist Dispensing
    • Test Reticles
  • Technical
    • Wafer Priming
    • HMDS
    • Lithography Process Overview
    • Reflectivity Control in Lithography
    • DUV Photoresist Processing
    • AZ nLoF 2000 Profile Tuning
    • AZ 5200 Image Reversal Recipe
  • About Us
  • News/Events
  • Contact

Technical Resources

 

Photoresist Processing:

Lithography Process Overview

Profile Tuning in AZ® nLoF 2000 Series Photoresists

Image Reversal Process for AZ® 5214E-IR Photoresist

Chemistry and Processing of DUV (Chemically Amplified) Photoresists

 

Process Optimization and Control:

Thin Film Interference and Reflectivity Control for Lithography

Effects of Ambient Humidity on Process Control

Adhesion Promotion Using Hexamethyldisilazane (HMDS)

 

Authorized Distributor

Copyright © 2013 Integrated Micro Materials

 

IMM and the IMM logo are trademarks of         H2A Technologies, Inc.

Toll Free: 888-632-0997
Fax: 940-228-2234
Website Services Provided By: